Device contamination by O2 plasma ashing.
نویسندگان
چکیده
منابع مشابه
Damage studies on irradiated tungsten by helium and argon ions in a plasma focus device
Damage of tungsten due to helium and argon ions of a PF device was studied. Tungsten samples were irradiated by 20 shots of the plasma focus device with argon and helium as working gases, separately. The tungsten surface was analyzed by SEM, before and after irradiation. SEM revealed dense blisters with diameters of a few hundred nanometers, on the samples which were irradiated by helium ions, ...
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ژورنال
عنوان ژورنال: Journal of the Surface Finishing Society of Japan
سال: 1990
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.41.121